10th Workshop on Crystalline Silicon Solar Cell Materials and Processes: Extended Abstracts and Papers: Workshop held 14-16 August 2000, Copper Mountain, Colorado

    Research output: Book/ReportBook

    Abstract

    The 10th Workshop will provide a forum for an informal exchange of technical and scientific information between international researchers in the photovoltaic and non-photovoltaic fields. Discussions will include the various aspects of impurities and defects in silicon-their properties, the dynamics during device processing, and their application for developing low-cost processes for manufacturinghigh-efficiency silicon solar cells. Sessions and panel discussions will also review thin-film crystalline-silicon PV, advanced cell structures, new processes and process characterization techniques, and future manufacturing requirements to meet the ambitious expansion goals described in the recently released U.S. PV Industry Roadmap. The Workshop will also provide an excellent opportunity forresearchers in private industry and at universities to recognize a mutual need for future collaborative research. The three-day workshop will consist of presentations by invited speakers, followed by discussion sessions. In addition, there will be two poster sessions presenting the latest research and development results. The subjects to be discussed include: solar cell processing, light-induceddegradation, gettering and passivation, crystalline silicon growth, thin-film silicon solar cells, and impurities and defects. Two special sessions will be featured at this workshop: advanced metallization and interconnections, and characterization methods.
    Original languageAmerican English
    Number of pages254
    StatePublished - 2000

    NREL Publication Number

    • NREL/BK-520-28844

    Fingerprint

    Dive into the research topics of '10th Workshop on Crystalline Silicon Solar Cell Materials and Processes: Extended Abstracts and Papers: Workshop held 14-16 August 2000, Copper Mountain, Colorado'. Together they form a unique fingerprint.

    Cite this