13.6% Efficient CuIn1-xGaxSe-Based Device from Electrodeposited Precursor

    Research output: Contribution to conferencePaper

    Abstract

    Copper-indium-gallium-selenium (Cu-In-Ga-Se) precursor thin films were prepared by electrodeposition techniques on molybdenum substrates. Additional In, Ga, and Se were added to the electrodeposited precursor film by physical evaporation to adjust the final composition to CuIn1-xGaxSe2. Devices with Ga/(In+Ga) ratio of 0.16, 0.26, and 0.39 were fabricated. The films have been characterized byinductive-coupled plasma spectrometry, Auger electron spectroscopy, X-ray, electron probes microanalysis, current-voltage characteristics, spectral response, and electron-beam-induced current. A ZnO/CdS/CuIn1-xGaxSe2 device fabricated using electrodeposited Cu-In-Ga-Se precursor layers resulted in an efficiency up to 13%.
    Original languageAmerican English
    Pages298-305
    Number of pages8
    StatePublished - 1997
    EventElectrochemical Society Symposium on Electrode Materials and Processes for Energy Conversion and Storage IV, 191st Meeting of the Electrochemical Society - Montreal, Canada
    Duration: 4 May 19979 May 1997

    Conference

    ConferenceElectrochemical Society Symposium on Electrode Materials and Processes for Energy Conversion and Storage IV, 191st Meeting of the Electrochemical Society
    CityMontreal, Canada
    Period4/05/979/05/97

    NREL Publication Number

    • NREL/CP-450-22771

    Fingerprint

    Dive into the research topics of '13.6% Efficient CuIn1-xGaxSe-Based Device from Electrodeposited Precursor'. Together they form a unique fingerprint.

    Cite this