Abstract
A photovoltaic conversion efficiency of 40.8% at 326 suns concentration is demonstrated in a monolithically grown, triple-junction III-V solar cell structure in which each active junction is composed of an alloy with a different lattice constant chosen to maximize the theoretical efficiency. The semiconductor structure was grown by organometallic vapor phase epitaxy in an inverted configuration with a 1.83 eV Ga.51 In.49 P top junction lattice-matched to the GaAs substrate, a metamorphic 1.34 eV In. 04 Ga.96 As middle junction, and a metamorphic 0.89 eV In.37 Ga.63 As bottom junction. The two metamorphic junctions contained approximately 1× 105 cm-2 and 2-3× 106 cm-2 threading dislocations, respectively.
Original language | American English |
---|---|
Article number | 123505 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 93 |
Issue number | 12 |
DOIs | |
State | Published - 2008 |
NREL Publication Number
- NREL/JA-520-43809
Keywords
- solar cell efficiency
- thin-film solar cells
- triple-junction solar cells