Abstract
We have been able to discount three point defects as the factor limiting GaInNAs material quality by comparing samples grown by two different growth techniques. Samples with vastly different concentrations of hydrogen and carbon have very similar properties in terms of deep levels, mobilities, and minority-carrier lifetimes. In addition, growth of hydrogen-free samples and corresponding measurements of vacancies provide strong evidence that gallium vacancies have an effect, but are not a limiting defect.
Original language | American English |
---|---|
Pages (from-to) | 392-398 |
Number of pages | 7 |
Journal | Journal of Crystal Growth |
Volume | 251 |
Issue number | 1-4 |
DOIs | |
State | Published - Apr 2003 |
Event | Proceedings of the Molecular Beam Epitaxy 2002 - San Francisco, CA, United States Duration: 15 Sep 2002 → 20 Sep 2002 |
NREL Publication Number
- NREL/JA-520-32846
Keywords
- A1. Impurities
- A1. Point defects
- A3. Metalorganic chemical vapor deposition
- A3. Molecular beam epitaxy
- B1. Nitrides