Abstract
We report on methods using time-of-flight secondary-ion mass spectrometry (TOF-SIMS) to elucidate critical information about the buried interfaces in interdigitated back-contact silicon solar cells. We examined the stoichiometry of the tunneling oxide with TOF-SIMS and X-ray photoelectron spectroscopy (XPS). Interestingly, the data indicates that the stoichiometry of the tunneling oxide moves away from SiO 2 towards lower stoichiometry (SiO x ) upon the crystallization annealing treatment, and towards SiO 2 again upon Al 2 O 3 deposition and a subsequent forming gas anneal. We also report on an important artifact for samples with an Al 2 O 3 passivation layer related to the oxygen content of the matrix.
Original language | American English |
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Pages | 2702-2706 |
Number of pages | 5 |
DOIs | |
State | Published - 2018 |
Event | 2017 IEEE 44th Photovoltaic Specialist Conference (PVSC) - Washington, D.C. Duration: 25 Jun 2017 → 30 Jun 2017 |
Conference
Conference | 2017 IEEE 44th Photovoltaic Specialist Conference (PVSC) |
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City | Washington, D.C. |
Period | 25/06/17 → 30/06/17 |
NREL Publication Number
- NREL/CP-5K00-67794
Keywords
- IBC cell
- passivated contact
- TOF-SIMS
- XPS