A Novel Method to Investigate Stoichiometry and Performance of Buried Passivated Contacts Utilizing Time-of-Flight SIMS

Research output: Contribution to conferencePaper

Abstract

We report on methods using time-of-flight secondary-ion mass spectrometry (TOF-SIMS) to elucidate critical information about the buried interfaces in interdigitated back-contact silicon solar cells. We examined the stoichiometry of the tunneling oxide with TOF-SIMS and X-ray photoelectron spectroscopy (XPS). Interestingly, the data indicates that the stoichiometry of the tunneling oxide moves away from SiO 2 towards lower stoichiometry (SiO x ) upon the crystallization annealing treatment, and towards SiO 2 again upon Al 2 O 3 deposition and a subsequent forming gas anneal. We also report on an important artifact for samples with an Al 2 O 3 passivation layer related to the oxygen content of the matrix.
Original languageAmerican English
Pages2702-2706
Number of pages5
DOIs
StatePublished - 2018
Event2017 IEEE 44th Photovoltaic Specialist Conference (PVSC) - Washington, D.C.
Duration: 25 Jun 201730 Jun 2017

Conference

Conference2017 IEEE 44th Photovoltaic Specialist Conference (PVSC)
CityWashington, D.C.
Period25/06/1730/06/17

NREL Publication Number

  • NREL/CP-5K00-67794

Keywords

  • IBC cell
  • passivated contact
  • TOF-SIMS
  • XPS

Fingerprint

Dive into the research topics of 'A Novel Method to Investigate Stoichiometry and Performance of Buried Passivated Contacts Utilizing Time-of-Flight SIMS'. Together they form a unique fingerprint.

Cite this