Abstract
The photovoltaic (PV) properties of undoped amorphous silicon (a-Si)/p-type crystalline silicon (c-Si) solar cells were found to improve by a hydrofluoric acid treatment of c-Si just prior to glow discharge depositon of a-Si. The short circuit current density (Jsc) improved from 2.7 to 23.5 mA/cm2 for an 0.1 .mu.m thick a-Si layer. This also resulted in an improved spectral response of the solarcell in the violet region of the spectrum. The enhanced properties have been attributed to the improved carrier transport across the interface, as seen in the current-voltage-temperature relationships, and also PC-1D simulation of the devices. Solar cells of a similar type were also fabricated by dc magnetron sputtering of the a-Si layer. HF passivated cells (area .apprx. 0.24 cm2) yielded about9.5% efficiency with Jsc of 30 mA/cm2 and a FF of 0.6, without use of an A/R coating. The variation of the PV properties of these cells was investigated as a function of a-Si thickness and c-Si doping.
Original language | American English |
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Pages | 77-82 |
Number of pages | 6 |
State | Published - 1996 |
Event | Thin Films for Photovoltaic and Related Device Applications: Materials Research Society Symposium - San Francisco, California Duration: 8 Apr 1996 → 11 Apr 1996 |
Conference
Conference | Thin Films for Photovoltaic and Related Device Applications: Materials Research Society Symposium |
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City | San Francisco, California |
Period | 8/04/96 → 11/04/96 |
Bibliographical note
Work performed by State University of New York at Buffalo, Amherst, New YorkNREL Publication Number
- NREL/CP-23029