Abstract
Rapid and contactless defect characterization is a very desirable goal in most current technologies. We will describe the contactless, resonant-coupled photoconductive decay (RCPCD) technique, as applied to a variety of wafer and thin-film materials. Using this technique, we can measure recombination lifetime over many decades of injection level. We can also measure relative values of minority-carrier mobility and diffusion length. By scanning the excitation wavelength, we can measure spectral response and photoconductive excitation spectra. Deep-level impurities can also be detected by several variations of RCPCD. We will show the general versatility of this technique.
| Original language | American English |
|---|---|
| Pages (from-to) | 161-172 |
| Number of pages | 12 |
| Journal | Materials Science and Engineering: B |
| Volume | 102 |
| Issue number | 1-3 |
| DOIs | |
| State | Published - 15 Sep 2003 |
| Event | E-MRS 2002 Symposium E - Strasbourg, France Duration: 18 Jun 2002 → 21 Jun 2002 |
NLR Publication Number
- NREL/JA-520-32452
Keywords
- Contactless
- Deep-level impurities
- Defect characterization
- Minority-carrier mobility
- RCPCD
- Recombination lifetime
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