Amorphous Semiconducting and Conducting Transparent Metal Oxide Thin Films and Production Thereof

NREL (Inventor)

    Research output: Patent

    Abstract

    Metal oxide thin films and production thereof are disclosed. An exemplary method of producing a metal oxide thin film may comprise introducing at least two metallic elements and oxygen into a process chamber to form a metal oxide. The method may also comprise depositing the metal oxide on a substrate in the process chamber. The method may also comprise simultaneously controlling a ratio of the atleast two metallic elements and a stoichiometry of the oxygen during deposition. Exemplary amorphous metal oxide thin films produced according to the methods herein may exhibit highly transparent properties, highly conductive properties, and/or other opto-electronic properties.
    Original languageAmerican English
    Patent number7,754,352
    StatePublished - 2010

    NREL Publication Number

    • NREL/PT-5200-51072

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