Amorphous Silicon Deposited at High Growth Rates Near the Onset of Microcrystallinity

Research output: Contribution to journal › Article › peer-review

Original language	American English
Pages (from-to)	450-454
Number of pages	5
Journal	Journal of Non-Crystalline Solids
Volume	266-269
DOIs	https://doi.org/10.1016/S0022-3093(00)00029-6
State	Published - 2000

Work performed by University of Oregon, Eugene, Oregon; Tsukuba-shi, Ibaraki, Japan; Solarex, Toano, Virginia

NREL Publication Number

@article{bb1402abfd2844ffa7535ab58fe533a4,

title = "Amorphous Silicon Deposited at High Growth Rates Near the Onset of Microcrystallinity",

author = "NREL",

note = "Work performed by University of Oregon, Eugene, Oregon; Tsukuba-shi, Ibaraki, Japan; Solarex, Toano, Virginia",

year = "2000",

doi = "10.1016/S0022-3093(00)00029-6",

language = "American English",

volume = "266-269",

pages = "450--454",

journal = "Journal of Non-Crystalline Solids",

issn = "0022-3093",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Amorphous Silicon Deposited at High Growth Rates Near the Onset of Microcrystallinity

AU - NREL, null

N1 - Work performed by University of Oregon, Eugene, Oregon; Tsukuba-shi, Ibaraki, Japan; Solarex, Toano, Virginia

PY - 2000

Y1 - 2000

U2 - 10.1016/S0022-3093(00)00029-6

DO - 10.1016/S0022-3093(00)00029-6

M3 - Article

SN - 0022-3093

VL - 266-269

SP - 450

EP - 454

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

ER -