An X-Ray Photoelectron Spectroscopy Investigation of O Impurity Chemistry in CdS Thin Films Grown By Chemical Bath Deposition

David W. Niles; Gregory Herdt; Mowafak Al-Jassim

doi:10.1063/1.364054

An X-Ray Photoelectron Spectroscopy Investigation of O Impurity Chemistry in CdS Thin Films Grown By Chemical Bath Deposition

David W. Niles, Gregory Herdt, Mowafak Al-Jassim

Materials Science

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Abstract

We used x-ray photoelectron spectroscopy to investigate the chemistry of O impurity atoms in CdS thin films grown for photovoltaic purposes by chemical-bath deposition (CBD). We compared the Cd 3d photoline, O 1 s photoline, Cd MNN Auger line, and O KLL Auger line taken from a CBD CdS thin film, CdS single-crystal reference, Cd metal reference, CdO reference, and Cd(OH)₂ reference. This comparison showed that the O present in thin-film CBD CdS is a manifestation of H₂O incorporated into the film during the CBD growth. Ar⁺ ion sputtering, a technique frequently used in thin-film analyses, preferentially removed S from the CBD CdS thin film and created CdS_{1 - x}O_x (x∼0.04) in the surface region from the incorporated O impurity.

Original language	American English
Pages (from-to)	1978-1984
Number of pages	7
Journal	Journal of Applied Physics
Volume	81
Issue number	4
DOIs	https://doi.org/10.1063/1.364054 https://doi.org/10.1063/1.364054
State	Published - 15 Feb 1997

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NREL/JA-412-21695

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title = "An X-Ray Photoelectron Spectroscopy Investigation of O Impurity Chemistry in CdS Thin Films Grown By Chemical Bath Deposition",

abstract = "We used x-ray photoelectron spectroscopy to investigate the chemistry of O impurity atoms in CdS thin films grown for photovoltaic purposes by chemical-bath deposition (CBD). We compared the Cd 3d photoline, O 1 s photoline, Cd MNN Auger line, and O KLL Auger line taken from a CBD CdS thin film, CdS single-crystal reference, Cd metal reference, CdO reference, and Cd(OH)2 reference. This comparison showed that the O present in thin-film CBD CdS is a manifestation of H2O incorporated into the film during the CBD growth. Ar+ ion sputtering, a technique frequently used in thin-film analyses, preferentially removed S from the CBD CdS thin film and created CdS1 - xOx (x∼0.04) in the surface region from the incorporated O impurity.",

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AU - Herdt, Gregory

AU - Al-Jassim, Mowafak

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N2 - We used x-ray photoelectron spectroscopy to investigate the chemistry of O impurity atoms in CdS thin films grown for photovoltaic purposes by chemical-bath deposition (CBD). We compared the Cd 3d photoline, O 1 s photoline, Cd MNN Auger line, and O KLL Auger line taken from a CBD CdS thin film, CdS single-crystal reference, Cd metal reference, CdO reference, and Cd(OH)2 reference. This comparison showed that the O present in thin-film CBD CdS is a manifestation of H2O incorporated into the film during the CBD growth. Ar+ ion sputtering, a technique frequently used in thin-film analyses, preferentially removed S from the CBD CdS thin film and created CdS1 - xOx (x∼0.04) in the surface region from the incorporated O impurity.

AB - We used x-ray photoelectron spectroscopy to investigate the chemistry of O impurity atoms in CdS thin films grown for photovoltaic purposes by chemical-bath deposition (CBD). We compared the Cd 3d photoline, O 1 s photoline, Cd MNN Auger line, and O KLL Auger line taken from a CBD CdS thin film, CdS single-crystal reference, Cd metal reference, CdO reference, and Cd(OH)2 reference. This comparison showed that the O present in thin-film CBD CdS is a manifestation of H2O incorporated into the film during the CBD growth. Ar+ ion sputtering, a technique frequently used in thin-film analyses, preferentially removed S from the CBD CdS thin film and created CdS1 - xOx (x∼0.04) in the surface region from the incorporated O impurity.

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An X-Ray Photoelectron Spectroscopy Investigation of O Impurity Chemistry in CdS Thin Films Grown By Chemical Bath Deposition

Abstract

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