Anneal Treatment to Reduce the Creation Rate of Light-Induced Metastable Defects in Device-Quality Hydrogenated Amorphous Silicon: Article No. 201908

Pauls Stradins, David Bobela

    Research output: Contribution to journalArticlepeer-review

    Original languageAmerican English
    Number of pages3
    JournalApplied Physics Letters
    Volume98
    Issue number20
    DOIs
    StatePublished - 2011

    NREL Publication Number

    • NREL/JA-5200-50307

    Keywords

    • defects
    • hydrogenated amorphous silicon
    • photodegradation

    Fingerprint

    Dive into the research topics of 'Anneal Treatment to Reduce the Creation Rate of Light-Induced Metastable Defects in Device-Quality Hydrogenated Amorphous Silicon: Article No. 201908'. Together they form a unique fingerprint.

    Cite this