Anneal Treatment to Reduce the Creation Rate of Light-Induced Metastable Defects in Device-Quality Hydrogenated Amorphous Silicon: Article No. 201908

Pauls Stradins; David Bobela

doi:10.1063/1.3592264

Anneal Treatment to Reduce the Creation Rate of Light-Induced Metastable Defects in Device-Quality Hydrogenated Amorphous Silicon: Article No. 201908

Research output: Contribution to journal › Article › peer-review

Original language	American English
Number of pages	3
Journal	Applied Physics Letters
Volume	98
Issue number	20
DOIs	https://doi.org/10.1063/1.3592264
State	Published - 2011

NREL Publication Number

NREL/JA-5200-50307

Keywords

defects
hydrogenated amorphous silicon
photodegradation

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10.1063/1.3592264

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title = "Anneal Treatment to Reduce the Creation Rate of Light-Induced Metastable Defects in Device-Quality Hydrogenated Amorphous Silicon: Article No. 201908",

keywords = "defects, hydrogenated amorphous silicon, photodegradation",

author = "Pauls Stradins and David Bobela",

year = "2011",

doi = "10.1063/1.3592264",

language = "American English",

volume = "98",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "20",

}

TY - JOUR

T1 - Anneal Treatment to Reduce the Creation Rate of Light-Induced Metastable Defects in Device-Quality Hydrogenated Amorphous Silicon

T2 - Article No. 201908

AU - Stradins, Pauls

AU - Bobela, David

PY - 2011

Y1 - 2011

KW - defects

KW - hydrogenated amorphous silicon

KW - photodegradation

UR - https://www.scopus.com/pages/publications/79957536529

U2 - 10.1063/1.3592264

DO - 10.1063/1.3592264

M3 - Article

SN - 0003-6951

VL - 98

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 20

ER -

Anneal Treatment to Reduce the Creation Rate of Light-Induced Metastable Defects in Device-Quality Hydrogenated Amorphous Silicon: Article No. 201908

NREL Publication Number

Keywords

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