Abstract
The p-type to n-type conversion induced in the GaInNAs via the in situ annealing processing was studied. The metalorganic chemical vapor deposition (MOCVD) grown p-type gallium compound was found to convert to n-type when annealed at a temperature of 650 °C. The secondary ion mass spectrometric (SIMS) technique show carbon and hydrogen contamination in the compound layers. Annealing in the absence of H was found to reduce the concentration of background acceptors, but was unable to produce an electron concentration of 10 17 cm -3.
Original language | American English |
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Pages (from-to) | 2505-2508 |
Number of pages | 4 |
Journal | Journal of Applied Physics |
Volume | 95 |
Issue number | 5 |
DOIs | |
State | Published - 2004 |
NREL Publication Number
- NREL/JA-520-35176