Anomalously High Thermal Conductivity of Amorphous Silicon Films Prepared by Hot-wire Chemical Vapor Deposition

Hoo Soon Yang, David Cahill, X Liu, J.L. Feldman, R.S. Crandall, B.A. Sperling, J.R. Abelson

Research output: Contribution to journal › Article › peer-review

NREL Publication Number

@article{a785531ca0fc45ccbec4eedccce49dd2,

title = "Anomalously High Thermal Conductivity of Amorphous Silicon Films Prepared by Hot-wire Chemical Vapor Deposition",

keywords = "amorphous silicon films, thermal conductivity",

author = "Yang, {Hoo Soon} and David Cahill and X Liu and J.L. Feldman and R.S. Crandall and B.A. Sperling and J.R. Abelson",

year = "2011",

language = "American English",

volume = "49",

pages = "359--368",

journal = "Chinese Journal of Physics",

issn = "0577-9073",

publisher = "Elsevier B.V.",

number = "1",

}

TY - JOUR

T1 - Anomalously High Thermal Conductivity of Amorphous Silicon Films Prepared by Hot-wire Chemical Vapor Deposition

AU - Yang, Hoo Soon

AU - Cahill, David

AU - Liu, X

AU - Feldman, J.L.

AU - Crandall, R.S.

AU - Sperling, B.A.

AU - Abelson, J.R.

PY - 2011

Y1 - 2011

KW - amorphous silicon films

KW - thermal conductivity

M3 - Article

SN - 0577-9073

VL - 49

SP - 359

EP - 368

JO - Chinese Journal of Physics

JF - Chinese Journal of Physics

IS - 1

ER -