Applying in Situ Bias During TOF-SIMS Analysis to Investigate Ion Migration in Perovskite Devices

Research output: Contribution to journalArticlepeer-review

Abstract

An in situ electrical bias was placed on a perovskite device through the device thickness while under investigation with time-of-flight secondary ion mass spectrometry. The applied bias resulted in an observed reversible migration of halide and lithium ions on the timescale of minutes. The results show a framework that can be used for further study of ion migration in perovskite materials and devices.
Original languageAmerican English
JournalMRS Communications
DOIs
StatePublished - 2025

NLR Publication Number

  • NREL/JA-5K00-93811

Keywords

  • perovskite
  • SIMS

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