Atomic Layer Deposition for Materials-Based H2 Storage: Mg(BH4)2 as a Case Study

Noemie Leick, Nicholas Strange, Thomas Gennett, Steven Christensen

Research output: NRELPresentation


To meet the requirements for vehicular solid-state hydrogen (H2) storage, novel materials such as metal borohydrides have increasingly been investigated, in particular, magnesium borohydride (Mg(BH4)2). While these materials have a high H2 capacity (> 14 wt%), poor hydrogenation-dehydrogenation cyclability and material degradation, (e.g., loss of boron), need to be overcome. Prior research has indicated that nano-encapsulation and chemical additives can address these challenges. Therefore, we pursued these two strategies simultaneously with atomic layer deposition (ALD) on Mg(BH4)2. We investigated the use of metal-oxides (e.g., Al2O3, TiO2, CeO2), Pt- group metals (e.g., Pd, Ru) as well as pulsing only one precursor molecule (e.g., Al(CH3)3, BBr3, TiCl4), and assessed these modified Mg(BH4)2 in terms of their H2 storage properties. This presentation will also present the benefits and limitations of using vapor-phase techniques to modify the properties of Mg(BH4)2.
Original languageAmerican English
Number of pages27
StatePublished - 2021

Publication series

NamePresented at the Advanced Surface Engineering (ASE) Summit, 9-11 June 2021

NREL Publication Number

  • NREL/PR-5900-80932


  • atomic layer deposition
  • hydrogen
  • magnesium borohydride


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