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Atomic Layer Deposition for Materials-Based H2 Storage: Opportunities and Limitations
Noemi Leick
,
Wade Braunecker
, Rachel Mow
, Nicholas Strange
, Steven Christensen
,
Thomas Gennett
Chemistry and Nanoscience
Materials Science
SLAC National Accelerator Laboratory
Research output
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NLR
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Material Science
Metal Hydride
100%
Desorption
80%
Metal-Organic Framework
60%
Surface (Surface Science)
60%
Magnesium
20%
Materials Property
20%
Chemisorption
20%
Monolayers
20%
Aluminum Oxide
20%
Surface Reaction
20%
Materials Class
20%
Zeolite
20%
Sorbent
20%
Enzymatic Hydrolysis
20%
Chemical Engineering
Atomic Layer Deposition
100%
Metal Complex
71%
Metal-Organic Frameworks
42%
Desorption Temperature
28%
Physisorption
14%
Desorption
14%
Functional Group
14%
Chemisorption
14%