Atomic-Scale Origin of Emission from Extended Defects in mc-Si

Research output: Contribution to conferencePaperpeer-review

Abstract

Defect luminescence in mc-Si has been extensively studied in the decades since it was first identified. The origin has been probed by the techniques of photoluminescence, cathodoluminescence, and by theoretical investigations. Due to detection limits and resolution inadequacies of these techniques a definitive explanation of defect luminescence phenomena has not yet been provided to the silicon PV community. This work combines the traditionally used techniques with a suite of atomic-scale characterization methods to probe the origins of defect luminescence in mc-Si PV material at the atomic level. High resolution transmission electron microscopy and laser-pulsed atom probe tomography provide the structural and chemical information necessary to provide definitive evidence of the origin of defect luminescence in mc-Si.

Original languageAmerican English
Pages2637-2640
Number of pages4
DOIs
StatePublished - 2013
Event39th IEEE Photovoltaic Specialists Conference, PVSC 2013 - Tampa, FL, United States
Duration: 16 Jun 201321 Jun 2013

Conference

Conference39th IEEE Photovoltaic Specialists Conference, PVSC 2013
Country/TerritoryUnited States
CityTampa, FL
Period16/06/1321/06/13

NREL Publication Number

  • NREL/CP-5200-57896

Keywords

  • Atom probe
  • Characterization
  • Crystalline silicon
  • Defect luminescence
  • Defects

Fingerprint

Dive into the research topics of 'Atomic-Scale Origin of Emission from Extended Defects in mc-Si'. Together they form a unique fingerprint.

Cite this