Band Gap Narrowing of ZnO:N Films by Varying RF Sputtering Power in O2/N2 Mixtures

Research output: Contribution to journalArticlepeer-review

Original languageAmerican English
Pages (from-to)L23-L26
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume25
Issue number4
DOIs
StatePublished - 2007

NREL Publication Number

  • NREL/JA-520-42159

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