Bandgap Reduction and Photoelectrochemical Properties of ZnO:N Films Deposited by Reactive RF Magnetron Sputtering

Kwang Soon Ahn, Sudhakar Shet, Todd Deutsch, Yanfa Yan, John Turner, N. M. Ravindra, M. Al-Jassim

Research output: Contribution to conferencePaperpeer-review

13 Scopus Citations

Abstract

ZnO:N films were deposited by reactive RF magnetron sputtering in mixed N2 and O2 gas ambient. Their PEC properties were measured and compared with those of as-grown and annealed ZnO films. The ZnO:N films exhibit photoresponse in the visible-light region, yielding higher total currents than pure ZnO thin films. With combined ultraviolet/infrared and color filtering, our data indicate that the main contribution to the high photocurrent is from the absorption of light in long-wavelength regions. Our results demonstrate that N incorporation in ZnO can narrow the bandgap and create absorption in the visible-light region for ZnO films, suggesting that N incorporation could be a potential method to improve the efficiency of PEC water splitting using ZnO-based materials.

Original languageAmerican English
Pages952-961
Number of pages10
StatePublished - 2008
EventMaterials Science and Technology Conference and Exhibition, MS and T'08 - Pittsburgh, PA, United States
Duration: 5 Oct 20089 Oct 2008

Conference

ConferenceMaterials Science and Technology Conference and Exhibition, MS and T'08
Country/TerritoryUnited States
CityPittsburgh, PA
Period5/10/089/10/08

NREL Publication Number

  • NREL/CP-520-43604

Keywords

  • bandgap
  • crystallinity
  • gas ambient
  • photoelectrochemical
  • RF power
  • sputter
  • visible light
  • ZnO

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