Abstract
We report the epitaxial growth of zinc-blende BxGa1 - x - y InyAs and BxGa1 - xAs on GaAs substrates with boron concentrations (x) up to 2%-4% by atmospheric-pressure metalorganic chemical vapor deposition. The band gap of BxGa1 - xAs increases by only 4-8 meV/%B with increasing boron concentration in this concentration range. We demonstrate an epitaxial BxGa1 - x - yIny,As layer deposited on GaAs with a band gap of 1.34 eV that is significantly less strained than a corresponding Ga1 - yInyAs layer with the same band gap.
Original language | American English |
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Pages (from-to) | 1443-1445 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 76 |
Issue number | 11 |
DOIs | |
State | Published - 2000 |
NREL Publication Number
- NREL/JA-520-27585