Boron Incorporation in Hydrogenated Amorphous Silicon Films Prepared by Chemical Vapor Deposition

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)1419-1422
    Number of pages4
    JournalJournal of Non-Crystalline Solids
    Volume97 & 98, Part II
    DOIs
    StatePublished - 1987

    Bibliographical note

    Work performed by Massachusetts Institute of Technology, Cambridge, Massachusetts

    NREL Publication Number

    • ACNR/JA-10058

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