Abstract
Normalized forms of conventional flux-distribution formulas are applied to physical-vapor deposition from open-boat type sources onto static and rotating substrates. For the rotating-substrate case, the deposition geometry that yields optimal film-thickness uniformity for different source-substrate separations is derived empirically. In addition, flux-distribution formulas are used to develop anovel method for combinatorial physical-vapor deposition. With this method, a single deposition system may be used, without modification, to deposit either highly uniform or graded-composition thin-film materials.
Original language | American English |
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Number of pages | 5 |
State | Published - 2005 |
Event | 2005 DOE Solar Energy Technologies Program Review Meeting - Denver, Colorado Duration: 7 Nov 2005 → 10 Nov 2005 |
Conference
Conference | 2005 DOE Solar Energy Technologies Program Review Meeting |
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City | Denver, Colorado |
Period | 7/11/05 → 10/11/05 |
Bibliographical note
Presented at the 2005 DOE Solar Energy Technologies Program Review Meeting held November 7-10, 2005 in Denver, Colorado. Also included in the proceedings available on CD-ROM (DOE/GO-102006-2245; NREL/CD-520-38557)NREL Publication Number
- NREL/CP-520-38950
Keywords
- NREL
- photovoltaics (PV)
- PV
- solar
- substrates