Calculations of Optimal Source Geometry and Controlled Combinatorial Gradients in Fixed- and Rotating-Substrate PVD Systems

Research output: Contribution to conferencePaper

Abstract

Normalized forms of conventional flux-distribution formulas are applied to physical-vapor deposition from open-boat type sources onto static and rotating substrates. For the rotating-substrate case, the deposition geometry that yields optimal film-thickness uniformity for different source-substrate separations is derived empirically. In addition, flux-distribution formulas are used to develop anovel method for combinatorial physical-vapor deposition. With this method, a single deposition system may be used, without modification, to deposit either highly uniform or graded-composition thin-film materials.
Original languageAmerican English
Number of pages5
StatePublished - 2005
Event2005 DOE Solar Energy Technologies Program Review Meeting - Denver, Colorado
Duration: 7 Nov 200510 Nov 2005

Conference

Conference2005 DOE Solar Energy Technologies Program Review Meeting
CityDenver, Colorado
Period7/11/0510/11/05

Bibliographical note

Presented at the 2005 DOE Solar Energy Technologies Program Review Meeting held November 7-10, 2005 in Denver, Colorado. Also included in the proceedings available on CD-ROM (DOE/GO-102006-2245; NREL/CD-520-38557)

NREL Publication Number

  • NREL/CP-520-38950

Keywords

  • NREL
  • photovoltaics (PV)
  • PV
  • solar
  • substrates

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