Capacitance Studies of Thermal Equilibrium Changes in N-Type Amorphous Silicon

Research output: Contribution to journal › Article

Original language	American English
Pages (from-to)	803-806
Number of pages	4
Journal	Journal of Non-Crystalline Solids
Volume	97 & 98, Part II
DOIs	https://doi.org/10.1016/0022-3093(87)90192-X
State	Published - 1987

Work performed by Xerox Palo Alto Research Center, Palo Alto, California

NREL Publication Number

@article{b51a527803dd4e28b3655f3ce42a8dbd,

title = "Capacitance Studies of Thermal Equilibrium Changes in N-Type Amorphous Silicon",

author = "NREL",

note = "Work performed by Xerox Palo Alto Research Center, Palo Alto, California",

year = "1987",

doi = "10.1016/0022-3093(87)90192-X",

language = "American English",

volume = "97 & 98, Part II",

pages = "803--806",

journal = "Journal of Non-Crystalline Solids",

issn = "0022-3093",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Capacitance Studies of Thermal Equilibrium Changes in N-Type Amorphous Silicon

AU - NREL, null

N1 - Work performed by Xerox Palo Alto Research Center, Palo Alto, California

PY - 1987

Y1 - 1987

U2 - 10.1016/0022-3093(87)90192-X

DO - 10.1016/0022-3093(87)90192-X

M3 - Article

SN - 0022-3093

VL - 97 & 98, Part II

SP - 803

EP - 806

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

ER -