Catalystlike Behavior of Si Adatoms in the Growth of Monolayer Al Film on Si(111): Article No. 014704

Lixin Zhang; Jing Teng; Ying Jiang; Jiandong Guo; Qinlin Guo; Enge Wang; Philipp Ebert; T. Sakurai; Kehui Wu

doi:10.1063/1.3455231

Catalystlike Behavior of Si Adatoms in the Growth of Monolayer Al Film on Si(111): Article No. 014704

Lixin Zhang, Jing Teng, Ying Jiang, Jiandong Guo, Qinlin Guo, Enge Wang, Philipp Ebert, T. Sakurai, Kehui Wu

Chemistry and Nanoscience

Research output: Contribution to journal › Article › peer-review

Original language	American English
Number of pages	5
Journal	The Journal of Chemical Physics
Volume	133
Issue number	1
DOIs	https://doi.org/10.1063/1.3455231
State	Published - 2010

NREL Publication Number

NREL/JA-590-49092

Keywords

AI Film
monolayer
ultrahigh vacuum

Access to Document

10.1063/1.3455231

Cite this

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title = "Catalystlike Behavior of Si Adatoms in the Growth of Monolayer Al Film on Si(111): Article No. 014704",

keywords = "AI Film, monolayer, ultrahigh vacuum",

author = "Lixin Zhang and Jing Teng and Ying Jiang and Jiandong Guo and Qinlin Guo and Enge Wang and Philipp Ebert and T. Sakurai and Kehui Wu",

year = "2010",

doi = "10.1063/1.3455231",

language = "American English",

volume = "133",

journal = "The Journal of Chemical Physics",

issn = "0021-9606",

publisher = "American Institute of Physics",

number = "1",

}

TY - JOUR

T1 - Catalystlike Behavior of Si Adatoms in the Growth of Monolayer Al Film on Si(111)

T2 - Article No. 014704

AU - Zhang, Lixin

AU - Teng, Jing

AU - Jiang, Ying

AU - Guo, Jiandong

AU - Guo, Qinlin

AU - Wang, Enge

AU - Ebert, Philipp

AU - Sakurai, T.

AU - Wu, Kehui

PY - 2010

Y1 - 2010

KW - AI Film

KW - monolayer

KW - ultrahigh vacuum

U2 - 10.1063/1.3455231

DO - 10.1063/1.3455231

M3 - Article

SN - 0021-9606

VL - 133

JO - The Journal of Chemical Physics

JF - The Journal of Chemical Physics

IS - 1

ER -