Chemical Vapor Deposition of Boron-Doped Hydrogenated Amorphous Silicon

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)135-137
    Number of pages3
    JournalApplied Physics Letters
    Volume47
    Issue number2
    DOIs
    StatePublished - 1985

    Bibliographical note

    Work performed by Chronar Corporation, Princeton, New Jersey

    NREL Publication Number

    • ACNR/JA-6633

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