Chemical Vapor Deposition of Boron-Doped Hydrogenated Amorphous Silicon

Research output: Contribution to journal › Article

Work performed by Chronar Corporation, Princeton, New Jersey

NLR Publication Number

@article{44048e5837aa4092bd03fb6966d39b27,

title = "Chemical Vapor Deposition of Boron-Doped Hydrogenated Amorphous Silicon",

author = "NREL",

note = "Work performed by Chronar Corporation, Princeton, New Jersey",

year = "1985",

doi = "10.1063/1.96432",

language = "American English",

volume = "47",

pages = "135--137",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "2",

}