Compensating Impurities as the Limiting Factor in Atmospheric Pressure Chemical Vapor Deposition of a-Si:H from Mg2Si Generated Higher Silanes

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)4669-4676
    Number of pages8
    JournalJournal of Applied Physics
    Issue number9
    StatePublished - 1988

    Bibliographical note

    Work performed by Department of Chemistry, Harvard University, Cambridge, Massachusetts

    NREL Publication Number

    • ACNR/JA-10690

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