Abstract
Conventional flux-distribution formulas for rotating and static substrates are used to develop a method for combinatorial physical-vapor deposition. With this method, a single deposition system may be used, without modification, to deposit either highly uniform or graded-composition thin-film materials. This is accomplished through appropriate automated sequencing of source shuttersand substrate rotation. A constrained-composition parametrization is introduced, whichdetermines relative deposition times for the film constituents with and without substraterotation. The combinatorial deposition scheme developed here is applicable to binary, ternary,or quaternary phase systems. Examples are considered for the pseudoquaternary CuIn Se2 -AgIn Se2 -CuGa Se2 -AgGa Se2 chalcopyrite materials system, which has relevance to thin-film photovoltaics.
| Original language | American English |
|---|---|
| Article number | 118604JVA |
| Pages (from-to) | 1119-1127 |
| Number of pages | 9 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 24 |
| Issue number | 4 |
| DOIs | |
| State | Published - 2006 |
NREL Publication Number
- NREL/JA-520-38716