Conformal Thin-Film Silicon Nitride Deposited by Hot-Wire Chemical Vapor Deposition

Qi Wang, Scott Ward, Lynn Gedvilas, Brian Keyes, Errol Sanchez, Shulin Wang

Research output: Contribution to journalArticlepeer-review

41 Scopus Citations


The deposition of silicon nitride thin films using a hot wire chemical vapor deposition (CVD) technique was investigated. The thin film deposition was enhanced by the addition of H 2 to the process. Growth of high quality films was found possible at low substrate temperatures. Near-perfect conformal coverage on nano-size features was exhibited by the thin films with H dilution. The silicon nitride film with a thickness of 500-Å was capable of giving a nearly 100% surface coverage on a 100 nm scale object, only at a optimized conditions.

Original languageAmerican English
Pages (from-to)338-340
Number of pages3
JournalApplied Physics Letters
Issue number3
StatePublished - 2004

NREL Publication Number

  • NREL/JA-520-34729


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