Abstract
The invention relates to a chemical vapor deposition process for the continuous growth of a carbon single-wall nanotube where a carbon-containing gas composition is contacted with a porous membrane and decomposed in the presence of a catalyst to grow single-wall carbon nanotube material. A pressure differential exists across the porous membrane such that the pressure on one side of the membrane is less than that on the other side of the membrane. The single-wall carbon nanotube growth may occur predominately on the low-pressure side of the membrane or, in a different embodiment of the invention, may occur predominately in between the catalyst and the membrane. The invention also relates to an apparatus used with the carbon vapor deposition process.
| Original language | American English |
|---|---|
| Patent number | 8,840,724 B2 |
| Filing date | 23/09/14 |
| State | Published - 2014 |
NREL Publication Number
- NREL/PT-5900-70401
Keywords
- carbon
- chemical vapor deposition
- nanotube
- porous membrane
- single-wall