Continuous Hot Wire Chemical Vapor Deposition of High-Density Carbon Multiwall Nanotubes

Anne C. Dillon, A. Harv Mahan, Philip A. Parilla, Jeffery L. Alleman, Michael J. Heben, Kim M. Jones, Katherine E.H. Gilbert

Research output: Contribution to journalArticlepeer-review

48 Scopus Citations

Abstract

Hot wire chemical vapor deposition (HWCVD) has been adapted to be a continuous growth process for high-density carbon multiwall nanotubes (MWNTs). MWNT growth is optimized in 1:5 CH4:Ar at 150 Torr with reactor temperatures of 400 and 550°C for static and flowing gases, respectively. Ferrocene is employed to provide a gas-phase catalyst. Highly graphitic nanotubes can be continuously deposited with iron content as low as 15 wt% and carbon impurities below thermal gravimetric analysis detection limits. The MWNTs are simply purified to ∼99.5 wt% with minimal structural damage and with a 75 wt% yield.

Original languageAmerican English
Pages (from-to)1425-1429
Number of pages5
JournalNano Letters
Volume3
Issue number10
DOIs
StatePublished - 2003

NREL Publication Number

  • NREL/JA-590-35451

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