Cracked Film Lithography with CuGaOx Buffers for Bifacial CdTe Photovoltaics: Article No. 2301939

Christopher Muzzillo, Matthew Reese, Chungho Lee, Gang Xiong

Research output: Contribution to journalArticlepeer-review

8 Scopus Citations

Abstract

Bifacial CdTe solar cells with greater power density than the monofacial baselines are demonstrated by using a CuGaOx rear interface buffer that passivates while reducing sheet resistance and contact resistance. Inserting CuGaOx between the CdTe and Au increases mean power density from 18.0 +/- 0.5 to 19.8 +/- 0.4 mW cm-2 for one sun front illumination. However, coupling CuGaOx with a transparent conductive oxide leads to an electrical barrier. Instead, CuGaOx is integrated with cracked film lithography (CFL)-patterned metal grids. CFL grid wires are spaced narrowly enough (approx. 10 um) to alleviate semiconductor resistance while retaining enough passivation and transmittance for a bifacial power gain: bifacial CuGaOx/CFL grids generate 19.1 +/- 0.6 mW cm-2 for 1 sun front + 0.08 sun rear illumination and 20.0 +/- 0.6 mW cm-2 at 1 sun front + 0.52 sun rear - the highest reported power density at field albedo conditions for a scaled polycrystalline absorber.
Original languageAmerican English
Number of pages6
JournalSmall
Volume19
Issue number28
DOIs
StatePublished - 2023

NREL Publication Number

  • NREL/JA-5K00-84785

Keywords

  • bifacial
  • CdTe
  • grids
  • lithography
  • photovoltaics
  • scalable

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