Abstract
Copper (I) oxide (Cu2O) is a direct band gap semiconductor with p-type conductivity and is a potential candidate for multi-junction solar cells. In this work, incoherent light source based photo-assisted metal-organic chemical vapor deposition (MOCVD) was used to deposit high quality Cu 2O thin films on n-type <100> silicon and quartz substrates. X-ray diffraction studies reveal that crystalline Cu2O is deposited. UV-Vis-NIR spectroscopy results indicated a band gap of 2.44 eV for Cu 2O thin films. Transmission electron spectroscopy results show tha. The Cu2O film grows i. The form of three-dimensional islands composed of smaller nanocrystalline grains i. The range of 10-20 nm. I-V measurements indicate tha. The Cu2O/n-Si device fabricated usin. The MOCVD process has a lower dark current density than other devices reported i. The literature.
Original language | American English |
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Pages (from-to) | 1740-1746 |
Number of pages | 7 |
Journal | Journal of Materials Research |
Volume | 28 |
Issue number | 13 |
DOIs | |
State | Published - 14 Jul 2013 |
NREL Publication Number
- NREL/JA-5200-60327