Deposition of a-Si,Sn:H Alloy Films by Reactive Magnetron Sputtering from Separate Si and Sn Targets

Research output: Contribution to journal › Article

Original language	American English
Pages (from-to)	470-474
Number of pages	5
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	4
Issue number	3, Part I
DOIs	https://doi.org/10.1116/1.573910
State	Published - 1986

Work performed by Department of Physics, North Carolina University, Raleigh, North Carolina

NREL Publication Number

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title = "Deposition of a-Si,Sn:H Alloy Films by Reactive Magnetron Sputtering from Separate Si and Sn Targets",

author = "NREL",

note = "Work performed by Department of Physics, North Carolina University, Raleigh, North Carolina",

year = "1986",

doi = "10.1116/1.573910",

language = "American English",

volume = "4",

pages = "470--474",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "3, Part I",

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T1 - Deposition of a-Si,Sn:H Alloy Films by Reactive Magnetron Sputtering from Separate Si and Sn Targets

AU - NREL, null

N1 - Work performed by Department of Physics, North Carolina University, Raleigh, North Carolina

PY - 1986

Y1 - 1986

U2 - 10.1116/1.573910

DO - 10.1116/1.573910

M3 - Article

SN - 0734-2101

VL - 4

SP - 470

EP - 474

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 3, Part I

ER -