Deposition of Device-Quality Amorphous and Microcrystalline Silicon Films with a New 'Hot Wire' CVD Technique

Deposition of Device-Quality Amorphous and Microcrystalline Silicon Films with a New 'Hot Wire' CVD Technique

Research output: Contribution to conference › Paper

Original language	American English
Pages	837-840
Number of pages	4
State	Published - 2000
Event	Twenty-Eighth IEEE Photovoltaic Specialists Conference 2000 - Anchorage, Alaska Duration: 15 Sep 2000 → 22 Sep 2000

Conference

Conference	Twenty-Eighth IEEE Photovoltaic Specialists Conference 2000
City	Anchorage, Alaska
Period	15/09/00 → 22/09/00

Bibliographical note

Work performed by MV Systems, Inc., Golden, Colorado

NREL Publication Number

NREL/CP-520-30347

Cite this

@conference{4099d10a38a048de9f1d47e53d5189a2,

title = "Deposition of Device-Quality Amorphous and Microcrystalline Silicon Films with a New 'Hot Wire' CVD Technique",

author = "NREL",

note = "Work performed by MV Systems, Inc., Golden, Colorado; Twenty-Eighth IEEE Photovoltaic Specialists Conference 2000 ; Conference date: 15-09-2000 Through 22-09-2000",

year = "2000",

language = "American English",

pages = "837--840",

}