Deposition of Device Quality, Low Hydrogen Content, Amorphous Silicon Films by Hot Filament Technique Using 'Safe' Silicon Source Gas

NREL (Inventor)

    Research output: Patent

    Original languageAmerican English
    Patent number5,776,819
    StatePublished - 1998

    NREL Publication Number

    • NREL/PT-520-25671

    Access to Document

    Cite this