| Original language | American English |
|---|---|
| Patent number | 5,776,819 |
| State | Published - 1998 |
NLR Publication Number
- NREL/PT-520-25671
Deposition of Device Quality, Low Hydrogen Content, Amorphous Silicon Films by Hot Filament Technique Using 'Safe' Silicon Source Gas
- NREL (Inventor)
Research output: Patent