| Original language | American English |
|---|---|
| Patent number | 6,468,885 B1 |
| State | Published - 2002 |
NLR Publication Number
- NREL/PT-520-33282
Deposition of Device Quality, Low Hydrogen Content, Hydrogenated Amorphous Silicon at High Deposition Rates
- NREL (Inventor)
Research output: Patent