Deposition of Device Quality ..mu..c-Si Films and Solar Cells at High Rates by HWCVD in a W Filament Regime where W/Si Formation is Minimal

Research output: Contribution to conferencePaper

Original languageAmerican English
Pages643-648
Number of pages6
StatePublished - 2003
EventAmorphous and Nanocrystalline Silicon-Based Films 2003: Materials Research Society Symposium - San Francisco, California
Duration: 22 Apr 200325 Apr 2003

Conference

ConferenceAmorphous and Nanocrystalline Silicon-Based Films 2003: Materials Research Society Symposium
CitySan Francisco, California
Period22/04/0325/04/03

NREL Publication Number

  • NREL/CP-520-36062

Cite this