Deposition of Photosensitive Hydrogenated Amorphous Silicon-Germanium Films with a Tantalum Hot Wire

Research output: Contribution to journalArticlepeer-review

Original languageAmerican English
Pages (from-to)198-201
Number of pages4
JournalThin Solid Films
Volume501
Issue number1-2
DOIs
StatePublished - 2006

NREL Publication Number

  • NREL/JA-520-38568

Keywords

  • amorphous silicon-germanium films
  • hot-wire chemical vapor deposition (HWCVD)
  • optical bandgap
  • photo-to-dark conductivity ratio
  • photon absorption coefficient
  • photosensitivity
  • Tauc band gap

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