Deposition of uc-SI and uc-Si-C Thin Films by Remote Plasma-Enhanced Chemical-Vapor Deposition

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)419-434
    Number of pages16
    JournalSolar Cells
    Volume30
    Issue numberComplete
    DOIs
    StatePublished - 1991

    Bibliographical note

    Department of Physics, and Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina

    NREL Publication Number

    • ACNR/JA-12430

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