Deposition Rates in Direct Current Diode Sputtering

Research output: Contribution to journal › Article

Original language	American English
Pages (from-to)	647-656
Number of pages	10
Journal	Journal of vacuum science & technology
Volume	11
Issue number	3
DOIs	https://doi.org/10.1116/1.578786
State	Published - 1993

Supported under grant DD-1-11001-1 through the University of Colorado

NLR Publication Number

@article{0dc908259f2542acbab11736ebba9e6e,

title = "Deposition Rates in Direct Current Diode Sputtering",

author = "NREL",

note = "Supported under grant DD-1-11001-1 through the University of Colorado",

year = "1993",

doi = "10.1116/1.578786",

language = "American English",

volume = "11",

pages = "647--656",

journal = "Journal of vacuum science \& technology",

issn = "0022-5355",

publisher = "American Institute of Physics",

number = "3",

}

TY - JOUR

T1 - Deposition Rates in Direct Current Diode Sputtering

AU - NREL, null

N1 - Supported under grant DD-1-11001-1 through the University of Colorado

PY - 1993

Y1 - 1993

U2 - 10.1116/1.578786

DO - 10.1116/1.578786

M3 - Article

SN - 0022-5355

VL - 11

SP - 647

EP - 656

JO - Journal of vacuum science & technology

JF - Journal of vacuum science & technology

IS - 3

ER -