Abstract
Production requirements for transparent conductors for thin film photovoltaics are reviewed, with particular reference to magnetron sputtered zinc oxide. On-going optimization processes for ZnO:Al prepared on 0.43 m2 substrates by bipolar, reactive sputtering from ZnO:Al2O3 targets and by reactive sputtering from a Zn:Al target are described. Optical emission from the plasma is used to study thestate of the sputtering target. Attention is drawn to the spatial dependence of deposition conditions under the cathode.
Original language | American English |
---|---|
Pages | 467-477 |
Number of pages | 11 |
State | Published - 1996 |
Event | Thin Films for Photovoltaic and Related Device Applications: Materials Research Society Symposium - San Francisco, California Duration: 8 Apr 1996 → 11 Apr 1996 |
Conference
Conference | Thin Films for Photovoltaic and Related Device Applications: Materials Research Society Symposium |
---|---|
City | San Francisco, California |
Period | 8/04/96 → 11/04/96 |
Bibliographical note
Work performed by Energy Photovoltaics, Inc., Princeton, New JerseyNREL Publication Number
- NREL/CP-23041