Design of Ultra-Broadband Antireflection Coatings Utilizing Integrated Moth-Eye Structures for Multi-Junction Device Applications

Emmett E. Perl; Chieh Ting Lin; William E. McMahon; John E. Bowers; Daniel J. Friedman

doi:10.1109/PVSC.2013.6744515

Design of Ultra-Broadband Antireflection Coatings Utilizing Integrated Moth-Eye Structures for Multi-Junction Device Applications

Emmett E. Perl, Chieh Ting Lin, William E. McMahon, John E. Bowers, Daniel J. Friedman

Chemistry and Nanoscience

University of California at Santa Barbara

Research output: Contribution to conference › Paper › peer-review

2 Scopus Citations

Abstract

Ultra-broadband Antireflection Coatings (ARCs) are essential to realizing the potential efficiency gains of four-junction photovoltaic devices that absorb to longer wavelengths than state-of-the-art three-junction cells. In this work, we examine a novel design that integrates a nanostructured antireflection layer with a multilayer ARC. Using optical models, we find that this hybrid approach can reduce the reflected AM1.5D power by 10-45 W/m² compared to conventional thin-film ARCs. A hybrid ARC is designed and fabricated on a sample consisting of approximately 1μm of indium gallium phosphide (InGaP) on gallium arsenide (GaAs). For the hybrid coating, we measure a reflection loss of just 23.9 W/m² corresponding to less than a 3% power reflection.

Original language	American English
Pages	1902-1906
Number of pages	5
DOIs	https://doi.org/10.1109/PVSC.2013.6744515 https://doi.org/10.1109/PVSC.2013.6744515
State	Published - 2013
Event	39th IEEE Photovoltaic Specialists Conference, PVSC 2013 - Tampa, FL, United States Duration: 16 Jun 2013 → 21 Jun 2013

Conference

Conference	39th IEEE Photovoltaic Specialists Conference, PVSC 2013
Country/Territory	United States
City	Tampa, FL
Period	16/06/13 → 21/06/13

NREL Publication Number

NREL/CP-5200-61950

Keywords

Biomimetics
III-V semiconductor materials
Nanophotonics
Optical films
Photovoltaic cells
Solar energy

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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Perl, E. E., Lin, C. T., McMahon, W. E., Bowers, J. E., & Friedman, D. J. (2013). Design of Ultra-Broadband Antireflection Coatings Utilizing Integrated Moth-Eye Structures for Multi-Junction Device Applications. 1902-1906. Paper presented at 39th IEEE Photovoltaic Specialists Conference, PVSC 2013, Tampa, FL, United States. https://doi.org/10.1109/PVSC.2013.6744515, https://doi.org/10.1109/PVSC.2013.6744515

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title = "Design of Ultra-Broadband Antireflection Coatings Utilizing Integrated Moth-Eye Structures for Multi-Junction Device Applications",

abstract = "Ultra-broadband Antireflection Coatings (ARCs) are essential to realizing the potential efficiency gains of four-junction photovoltaic devices that absorb to longer wavelengths than state-of-the-art three-junction cells. In this work, we examine a novel design that integrates a nanostructured antireflection layer with a multilayer ARC. Using optical models, we find that this hybrid approach can reduce the reflected AM1.5D power by 10-45 W/m2 compared to conventional thin-film ARCs. A hybrid ARC is designed and fabricated on a sample consisting of approximately 1μm of indium gallium phosphide (InGaP) on gallium arsenide (GaAs). For the hybrid coating, we measure a reflection loss of just 23.9 W/m2 corresponding to less than a 3% power reflection.",

keywords = "Biomimetics, III-V semiconductor materials, Nanophotonics, Optical films, Photovoltaic cells, Solar energy",

author = "Perl, {Emmett E.} and Lin, {Chieh Ting} and McMahon, {William E.} and Bowers, {John E.} and Friedman, {Daniel J.}",

year = "2013",

doi = "10.1109/PVSC.2013.6744515",

language = "American English",

pages = "1902--1906",

note = "39th IEEE Photovoltaic Specialists Conference, PVSC 2013 ; Conference date: 16-06-2013 Through 21-06-2013",

}

Perl, EE, Lin, CT, McMahon, WE, Bowers, JE & Friedman, DJ 2013, 'Design of Ultra-Broadband Antireflection Coatings Utilizing Integrated Moth-Eye Structures for Multi-Junction Device Applications', Paper presented at 39th IEEE Photovoltaic Specialists Conference, PVSC 2013, Tampa, FL, United States, 16/06/13 - 21/06/13 pp. 1902-1906. https://doi.org/10.1109/PVSC.2013.6744515, https://doi.org/10.1109/PVSC.2013.6744515

Design of Ultra-Broadband Antireflection Coatings Utilizing Integrated Moth-Eye Structures for Multi-Junction Device Applications. / Perl, Emmett E.; Lin, Chieh Ting; McMahon, William E. et al.
2013. 1902-1906 Paper presented at 39th IEEE Photovoltaic Specialists Conference, PVSC 2013, Tampa, FL, United States.

Research output: Contribution to conference › Paper › peer-review

TY - CONF

T1 - Design of Ultra-Broadband Antireflection Coatings Utilizing Integrated Moth-Eye Structures for Multi-Junction Device Applications

AU - Perl, Emmett E.

AU - Lin, Chieh Ting

AU - McMahon, William E.

AU - Bowers, John E.

AU - Friedman, Daniel J.

PY - 2013

Y1 - 2013

N2 - Ultra-broadband Antireflection Coatings (ARCs) are essential to realizing the potential efficiency gains of four-junction photovoltaic devices that absorb to longer wavelengths than state-of-the-art three-junction cells. In this work, we examine a novel design that integrates a nanostructured antireflection layer with a multilayer ARC. Using optical models, we find that this hybrid approach can reduce the reflected AM1.5D power by 10-45 W/m2 compared to conventional thin-film ARCs. A hybrid ARC is designed and fabricated on a sample consisting of approximately 1μm of indium gallium phosphide (InGaP) on gallium arsenide (GaAs). For the hybrid coating, we measure a reflection loss of just 23.9 W/m2 corresponding to less than a 3% power reflection.

AB - Ultra-broadband Antireflection Coatings (ARCs) are essential to realizing the potential efficiency gains of four-junction photovoltaic devices that absorb to longer wavelengths than state-of-the-art three-junction cells. In this work, we examine a novel design that integrates a nanostructured antireflection layer with a multilayer ARC. Using optical models, we find that this hybrid approach can reduce the reflected AM1.5D power by 10-45 W/m2 compared to conventional thin-film ARCs. A hybrid ARC is designed and fabricated on a sample consisting of approximately 1μm of indium gallium phosphide (InGaP) on gallium arsenide (GaAs). For the hybrid coating, we measure a reflection loss of just 23.9 W/m2 corresponding to less than a 3% power reflection.

KW - Biomimetics

KW - III-V semiconductor materials

KW - Nanophotonics

KW - Optical films

KW - Photovoltaic cells

KW - Solar energy

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DO - 10.1109/PVSC.2013.6744515

M3 - Paper

AN - SCOPUS:84896463541

SP - 1902

EP - 1906

T2 - 39th IEEE Photovoltaic Specialists Conference, PVSC 2013

Y2 - 16 June 2013 through 21 June 2013

ER -

Design of Ultra-Broadband Antireflection Coatings Utilizing Integrated Moth-Eye Structures for Multi-Junction Device Applications

Abstract

Conference

NREL Publication Number

Keywords

UN SDGs

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