Determination of the Fluorine Content in a-Si:H:F by Infrared Spectroscopy, Electron Probe Microanalysis, X-ray Photoelectron Spectroscopy, and Secondary Ion Mass Spectrometry

doi:10.1063/1.343168

Determination of the Fluorine Content in a-Si:H:F by Infrared Spectroscopy, Electron Probe Microanalysis, X-ray Photoelectron Spectroscopy, and Secondary Ion Mass Spectrometry

Research output: Contribution to journal › Article

Original language	American English
Pages (from-to)	5154-5160
Number of pages	7
Journal	Journal of Applied Physics
Volume	65
Issue number	12
DOIs	https://doi.org/10.1063/1.343168
State	Published - 1989

NREL Publication Number

ACNR/JA-212-11234

Access to Document

10.1063/1.343168

Cite this

@article{a3717d7aa405404ea5a9e84e3f7713f7,

title = "Determination of the Fluorine Content in a-Si:H:F by Infrared Spectroscopy, Electron Probe Microanalysis, X-ray Photoelectron Spectroscopy, and Secondary Ion Mass Spectrometry",

author = "NREL",

year = "1989",

doi = "10.1063/1.343168",

language = "American English",

volume = "65",

pages = "5154--5160",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "12",

}

TY - JOUR

T1 - Determination of the Fluorine Content in a-Si:H:F by Infrared Spectroscopy, Electron Probe Microanalysis, X-ray Photoelectron Spectroscopy, and Secondary Ion Mass Spectrometry

AU - NREL, null

PY - 1989

Y1 - 1989

U2 - 10.1063/1.343168

DO - 10.1063/1.343168

M3 - Article

SN - 0021-8979

VL - 65

SP - 5154

EP - 5160

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 12

ER -