Deuteron Magnetic Resonance Studies of Structure and Photo-Induced Metastable Rearrangements in Deuterated Amorphous Si, Ge and SiGe Films

Deuteron Magnetic Resonance Studies of Structure and Photo-Induced Metastable Rearrangements in Deuterated Amorphous Si, Ge and SiGe Films

Research output: Contribution to conference › Paper

Original language	American English
Pages	377-388
Number of pages	12
State	Published - 1992
Event	Amorphous Silicon Technology - 1992: Materials Research Society Symposium - San Francisco, California Duration: 27 Apr 1992 → 1 May 1992

Conference

Conference	Amorphous Silicon Technology - 1992: Materials Research Society Symposium
City	San Francisco, California
Period	27/04/92 → 1/05/92

Bibliographical note

Work performed by Washington University, St. Louis, Missouri and Harvard University, Cambridge, Massachusetts

NREL Publication Number

ACNR/CP-14610

Cite this

@conference{5a214f3a455349a0bb4424c2b823b8b6,

title = "Deuteron Magnetic Resonance Studies of Structure and Photo-Induced Metastable Rearrangements in Deuterated Amorphous Si, Ge and SiGe Films",

author = "NREL",

note = "Work performed by Washington University, St. Louis, Missouri and Harvard University, Cambridge, Massachusetts; Amorphous Silicon Technology - 1992: Materials Research Society Symposium ; Conference date: 27-04-1992 Through 01-05-1992",

year = "1992",

language = "American English",

pages = "377--388",

}

TY - CONF

T1 - Deuteron Magnetic Resonance Studies of Structure and Photo-Induced Metastable Rearrangements in Deuterated Amorphous Si, Ge and SiGe Films

AU - NREL, null

N1 - Work performed by Washington University, St. Louis, Missouri and Harvard University, Cambridge, Massachusetts

PY - 1992

Y1 - 1992

M3 - Paper

SP - 377

EP - 388

T2 - Amorphous Silicon Technology - 1992: Materials Research Society Symposium

Y2 - 27 April 1992 through 1 May 1992

ER -