Development of Radio-Frequency Magnetron Sputtered Indium Molybdenum Oxide

Y. Yoshida; T. A. Gessert; C. L. Perkins; T. J. Coutts

doi:10.1116/1.1586281

Development of Radio-Frequency Magnetron Sputtered Indium Molybdenum Oxide

Y. Yoshida, T. A. Gessert, C. L. Perkins, T. J. Coutts

Materials Science

Research output: Contribution to journal › Article › peer-review

74 Scopus Citations

Abstract

Radio-frequency (rf) magnetron sputtering was used to investigate the effects of oxygen partial pressure and substrate temperature on the electrical properties of IMO films. In addition, comparisons of IMO films with In₂O₃ films prepared similarly were used to illustrate the effects of the Mo dopant.

Original language	American English
Pages (from-to)	1092-1097
Number of pages	6
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	21
Issue number	4
DOIs	https://doi.org/10.1116/1.1586281 https://doi.org/10.1116/1.1586281
State	Published - 2003

NREL Publication Number

NREL/JA-520-33053

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title = "Development of Radio-Frequency Magnetron Sputtered Indium Molybdenum Oxide",

abstract = "Radio-frequency (rf) magnetron sputtering was used to investigate the effects of oxygen partial pressure and substrate temperature on the electrical properties of IMO films. In addition, comparisons of IMO films with In2O3 films prepared similarly were used to illustrate the effects of the Mo dopant.",

author = "Y. Yoshida and Gessert, {T. A.} and Perkins, {C. L.} and Coutts, {T. J.}",

year = "2003",

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journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

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AU - Yoshida, Y.

AU - Gessert, T. A.

AU - Perkins, C. L.

AU - Coutts, T. J.

PY - 2003

Y1 - 2003

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AB - Radio-frequency (rf) magnetron sputtering was used to investigate the effects of oxygen partial pressure and substrate temperature on the electrical properties of IMO films. In addition, comparisons of IMO films with In2O3 films prepared similarly were used to illustrate the effects of the Mo dopant.

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U2 - 10.1116/1.1586281

DO - 10.1116/1.1586281

M3 - Article

AN - SCOPUS:0041529608

SN - 0734-2101

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JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 4

ER -

Development of Radio-Frequency Magnetron Sputtered Indium Molybdenum Oxide

Abstract

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