Diffractive Light Trapping in Crystal-Silicon Films: Experiment and Electromagnetic Modeling

Dirk N. Weiss, Benjamin G. Lee, Dustin A. Richmond, William Nemeth, Qi Wang, Douglas A. Keszler, Howard M. Branz

Research output: Contribution to journalArticlepeer-review

3 Scopus Citations


Diffractive light trapping in 1:5 μm thick crystal silicon films is studied experimentally through hemispherical reflection measurements and theoretically through rigorous coupled-wave analysis modeling. The gratings were fabricated by nanoimprinting of dielectric precursor films. The model data, which match the experimental results well without the use of any fitting parameters, are used to extract the light trapping efficiency. Diffractive light trapping is studied as a function of incidence angle, and an enhancement of light absorption is found for incidence angles up to 50° for both TE and TM polarizations.

Original languageAmerican English
Pages (from-to)5728-5734
Number of pages7
JournalApplied Optics
Issue number29
StatePublished - 10 Oct 2011

NREL Publication Number

  • NREL/JA-5200-53578


  • crystal silicon films
  • electromagnetic modeling


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