Diffractive Light Trapping in Crystal-Silicon Films: Experiment and Electromagnetic Modeling

Dirk N. Weiss; Benjamin G. Lee; Dustin A. Richmond; William Nemeth; Qi Wang; Douglas A. Keszler; Howard M. Branz

doi:10.1364/AO.50.005728

Diffractive Light Trapping in Crystal-Silicon Films: Experiment and Electromagnetic Modeling

Dirk N. Weiss, Benjamin G. Lee, Dustin A. Richmond, William Nemeth, Qi Wang, Douglas A. Keszler, Howard M. Branz

Chemistry and Nanoscience

Research output: Contribution to journal › Article › peer-review

3 Scopus Citations

Abstract

Diffractive light trapping in 1:5 μm thick crystal silicon films is studied experimentally through hemispherical reflection measurements and theoretically through rigorous coupled-wave analysis modeling. The gratings were fabricated by nanoimprinting of dielectric precursor films. The model data, which match the experimental results well without the use of any fitting parameters, are used to extract the light trapping efficiency. Diffractive light trapping is studied as a function of incidence angle, and an enhancement of light absorption is found for incidence angles up to 50° for both TE and TM polarizations.

Original language	American English
Pages (from-to)	5728-5734
Number of pages	7
Journal	Applied Optics
Volume	50
Issue number	29
DOIs	https://doi.org/10.1364/AO.50.005728 https://doi.org/10.1364/AO.50.005728
State	Published - 10 Oct 2011

NREL Publication Number

NREL/JA-5200-53578

Keywords

crystal silicon films
electromagnetic modeling

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title = "Diffractive Light Trapping in Crystal-Silicon Films: Experiment and Electromagnetic Modeling",

abstract = "Diffractive light trapping in 1:5 μm thick crystal silicon films is studied experimentally through hemispherical reflection measurements and theoretically through rigorous coupled-wave analysis modeling. The gratings were fabricated by nanoimprinting of dielectric precursor films. The model data, which match the experimental results well without the use of any fitting parameters, are used to extract the light trapping efficiency. Diffractive light trapping is studied as a function of incidence angle, and an enhancement of light absorption is found for incidence angles up to 50° for both TE and TM polarizations.",

keywords = "crystal silicon films, electromagnetic modeling",

author = "Weiss, {Dirk N.} and Lee, {Benjamin G.} and Richmond, {Dustin A.} and William Nemeth and Qi Wang and Keszler, {Douglas A.} and Branz, {Howard M.}",

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AU - Weiss, Dirk N.

AU - Lee, Benjamin G.

AU - Richmond, Dustin A.

AU - Nemeth, William

AU - Wang, Qi

AU - Keszler, Douglas A.

AU - Branz, Howard M.

PY - 2011/10/10

Y1 - 2011/10/10

N2 - Diffractive light trapping in 1:5 μm thick crystal silicon films is studied experimentally through hemispherical reflection measurements and theoretically through rigorous coupled-wave analysis modeling. The gratings were fabricated by nanoimprinting of dielectric precursor films. The model data, which match the experimental results well without the use of any fitting parameters, are used to extract the light trapping efficiency. Diffractive light trapping is studied as a function of incidence angle, and an enhancement of light absorption is found for incidence angles up to 50° for both TE and TM polarizations.

AB - Diffractive light trapping in 1:5 μm thick crystal silicon films is studied experimentally through hemispherical reflection measurements and theoretically through rigorous coupled-wave analysis modeling. The gratings were fabricated by nanoimprinting of dielectric precursor films. The model data, which match the experimental results well without the use of any fitting parameters, are used to extract the light trapping efficiency. Diffractive light trapping is studied as a function of incidence angle, and an enhancement of light absorption is found for incidence angles up to 50° for both TE and TM polarizations.

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KW - electromagnetic modeling

UR - http://www.scopus.com/inward/record.url?scp=80053931576&partnerID=8YFLogxK

U2 - 10.1364/AO.50.005728

DO - 10.1364/AO.50.005728

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EP - 5734

JO - Applied Optics

JF - Applied Optics

IS - 29

ER -

Diffractive Light Trapping in Crystal-Silicon Films: Experiment and Electromagnetic Modeling

Abstract

NREL Publication Number

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