Dislocation Generation in Silicon by Thermal Stresses: Paper No. 313

Research output: Contribution to conference › Paper

Original language	American English
Pages	Volume II: 1681-1689
Number of pages	9
State	Published - 2005
Event	XIII International Workshop on Physics of Semiconductor Devices (IWPSD-2005) - New Delhi, India Duration: 13 Dec 2005 → 17 Dec 2005

Conference	XIII International Workshop on Physics of Semiconductor Devices (IWPSD-2005)
City	New Delhi, India
Period	13/12/05 → 17/12/05

NREL Publication Number

@conference{dbe91aba28c94cc7844ab15fd149082a,

title = "Dislocation Generation in Silicon by Thermal Stresses: Paper No. 313",

author = "NREL",

year = "2005",

language = "American English",

pages = "Volume II: 1681--1689",

note = "XIII International Workshop on Physics of Semiconductor Devices (IWPSD-2005) ; Conference date: 13-12-2005 Through 17-12-2005",

}